Journal of Semiconductor Technology and Science

Journal of Semiconductor Technology and Science is published to provide a forum for R&D people involved in wider scope of the integrated circuit technology, i.e., VLSI fabrication process technology, device technology, circuit design, packaging, test and other novel applications of this ever scaling technology. When IC was invented, these people worked together in one place, and understood every details of the flow from bare silicon to package testing. However, as the IC evolves with Moore’s curve, in-depth knowledge content has exploded, and our individual expertise has to become narrowed down. As a result, different branches in the technical society were created, and have made it more difficult to communicate as a whole. The fisherman, however, always knows that he can capture more fish at the border where warm and cold-water meet. Thus, we decided to break the knowledge barrier, by providing communication channel for people working in relevant VLSI technology in common subject “Device & Design Integration”. Treaties on core technology that will affect the device including CMOS and MEMS devices, from the substrate to gate fabrication and its characterization and analysis are our major focus. The other focus is how to make the device function in a system and its verification the design. This device & design forum should provide better use of the other information and enhance the overall VLSI technology, eventually serving better to create more efficient devices and systems.