In 1983, the two journals, Journal of Vacuum Science and Technology A and B were launched when the original Journal of Vacuum Science and Technology was split. JVSTA is devoted to publishing reports of original research, letters, and review articles on interfaces and surfaces of materials, thin films, and plasmas. JVSTA publishes reports that advance the fundamental understanding of interfaces and surfaces at a fundamental level and that use this understanding to advance the state of the art in various technological applications. The scope includes, but is not limited to, the following topics: Applied and fundamental surface science Atomic layer deposition Electronic and photonic materials and their processing Magnetic thin films and interfaces Materials and thin films for energy conversion and storage Photovoltaics, including inorganic and organic thin-film solar cells Plasma science and technology, including plasma-surface interactions, plasma diagnostics plasma deposition and etching, and applications of plasmas to micro- and nanoelectronics Surface engineering Thin film deposition, etching, properties, and characterization Transmission electron microscopy, including in situ methods Tribology Vacuum science and technology
1983年,原《真空科学与技术杂志》拆分后,创办了《真空科学与技术杂志A》和《真空科学与技术杂志B》。 JVSTA致力于出版关于材料、薄膜和等离子体的界面和表面的原始研究报告、信件和评论文章。JVSTA发布的报告在基本层面上促进了对接口和表面的基本理解,并使用这种理解促进了各种技术应用程序中的最新技术。范围包括但不限于以下主题: 应用和基础表面科学 原子层沉积 电子和光子材料及其加工 磁性薄膜和界面 用于能量转换和储存的材料和薄膜 光伏,包括无机和有机薄膜太阳能电池 等离子体科学与技术,包括等离子体-表面相互作用、等离子体诊断、等离子体沉积和蚀刻以及等离子体在微电子和纳米电子领域的应用 表面工程 薄膜沉积、蚀刻、性质及特性 透射电镜,包括原位法 摩擦学 真空科学与技术
期刊ISSN
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0734-2101 |
最新的影响因子
|
2.9 |
最新CiteScore值
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N/A |
最新自引率
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12.50% |
期刊官方网址
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http://avspublications.org/jvsta/ |
期刊投稿网址
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http://jvsta.peerx-press.org/cgi-bin/main.plex |
通讯地址
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A V S AMER INST PHYSICS, STE 1 NO 1, 2 HUNTINGTON QUADRANGLE, MELVILLE, USA, NY, 11747-4502 |
偏重的研究方向(学科)
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工程技术-材料科学:膜 |
出版周期
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Bimonthly |
平均审稿速度
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一般,3-6周 |
出版年份
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0 |
出版国家/地区
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UNITED STATES |
是否OA
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No |
SCI期刊coverage
|
Science Citation Index Expanded(科学引文索引扩展) |
NCBI查询
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PubMed Central (PMC)链接 全文检索(pubmed central) |
最新中科院JCR分区
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大类(学科)
小类(学科)
JCR学科排名
物理
MATERIALS SCIENCE, COATINGS & FILMS(材料科学,涂料和薄膜) 3区
PHYSICS, APPLIED(物理学,应用) 3区
10/19
74/146
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最新的影响因子
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2.9 | |||||||
最新公布的期刊年发文量 |
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总被引频次 | 9302 | |||||||
特征因子 | 0.005680 | |||||||
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2007年以来影响因子趋势图(整体平稳趋势)
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最新CiteScore值
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N/A
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N/A | ||||||||||
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N/A | ||||||||||
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scopus涵盖范围 |
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